1～2 item / All 2 items
Device dimensions: 1200W × 1100D × 2000H (200CBT) / 1500W × 1100D × 2000H (300CBT)
Set the substrate in the chuck manually, then perform paddle development, rinsing, and spin drying.
Automatic processing of each step from paddle development, spray development, rinsing, to spin drying!
We would like to introduce the "Sheet-Type Spin Developer" that we handle. By simply setting the cassette in the loader, the clean robot automatically transports the workpiece and processes each step automatically. For developing large substrates, we recommend the coating method. In the manual type, the workpiece can be manually set in the chuck, and similar developing, rinsing, and spin-drying processes can be performed. 【Specifications (partial)】 ■ Work Material - Si, SiC, GaN, GaAs, InP, LT/LN, ceramics, quartz, resin, glass, etc. ■ Developer: TMAH, Na2CO3, cyclopentane (independent chamber) ■ Rinse Liquid: DIW, PGMEA, etc. ■ Back Rinse: PGMEA, etc. ■ Coating Method: Shower or nozzle *For more details, please download the PDF or feel free to contact us.
